Study of polycrystalline-Si thin-film transistors with different channel layer thickness at low bias voltage

Autor: Juang, Miin-Horng, Chang, C.W., Wang, J.L., Shye, D.C., Hwang, C.C., Jang, S.L.
Zdroj: In Microelectronic Engineering 2010 87(10):1896-1900
Databáze: ScienceDirect