Mechanism of porous low- k film damage induced by plasma etching radicals
| Autor: | Iba, Y., Ozaki, S., Sasaki, M., Kobayashi, Y., Kirimura, T., Nakata, Y. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2010 87(3):451-456 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
| Autor: | Iba, Y., Ozaki, S., Sasaki, M., Kobayashi, Y., Kirimura, T., Nakata, Y. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2010 87(3):451-456 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect