Investigation of physical and chemical property changes of ultra low-κ SiOCH in aspect of cleaning and chemical repair processes
| Autor: | Oszinda, Thomas, Schaller, Matthias, Fischer, Daniel, Walsh, Christine, Schulz, Stefan E. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2010 87(3):457-461 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect