Ge integration on Si via rare earth oxide buffers: From MBE to CVD (Invited Paper)
| Autor: | Schroeder, T., Giussani, A., Muessig, H.-J., Weidner, G., Costina, I., Wenger, Ch., Lukosius, M., Storck, P., Zaumseil, P. |
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| Zdroj: | In Microelectronic Engineering 2009 86(7):1615-1620 |
| Databáze: | ScienceDirect |
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