Improved manufacturability of ZrO 2 MIM capacitors by process stabilizing HfO 2 addition

Autor: Müller, J., Böscke, T.S., Schröder, U., Reinicke, M., Oberbeck, L., Zhou, D., Weinreich, W., Kücher, P., Lemberger, M., Frey, L.
Zdroj: In Microelectronic Engineering 2009 86(7):1818-1821
Databáze: ScienceDirect