Significant reduction of Positive Bias Temperature Instability in high-k/metal-gate nFETs by incorporation of rare earth metals
| Autor: | Kaczer, B., Veloso, A., Aoulaiche, M., Groeseneken, G. |
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| Zdroj: | In Microelectronic Engineering 2009 86(7):1894-1896 |
| Databáze: | ScienceDirect |
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