A study on fluorine incorporation in Ge p-MOS capacitors with HfTiON dielectric
| Autor: | Li, C.X., Wang, C.D., Leung, C.H., Lai, P.T., Xu, J.P. |
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| Zdroj: | In Microelectronic Engineering 2009 86(7):1596-1598 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Li, C.X., Wang, C.D., Leung, C.H., Lai, P.T., Xu, J.P. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2009 86(7):1596-1598 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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