Electrochemical behavior of copper and cobalt in post-etch cleaning solutions
| Autor: | Bilouk, S., Broussous, L., Nogueira, R.P., Ivanova, V., Pernel, C. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2009 86(10):2038-2044 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect