High flowability monomer resists for thermal nanoimprint lithography
| Autor: | Perez Toralla, K., De Girolamo, J., Truffier-Boutry, D., Gourgon, C., Zelsmann, M. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2009 86(4):779-782 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect