mr-NIL 6000LT – Epoxy-based curing resist for combined thermal and UV nanoimprint lithography below 50 °C
| Autor: | Schuster, Christine, Reuther, Freimut, Kolander, Anett, Gruetzner, Gabi |
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| Zdroj: | In Microelectronic Engineering 2009 86(4):722-725 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect