A model of self-limiting residual acid diffusion for pattern doubling
| Autor: | Fuhrmann, Jürgen, Fiebach, André, Uhle, Manfred, Erdmann, Andreas, Szmanda, Charles R., Truong, Chi |
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| Zdroj: | In Microelectronic Engineering 2009 86(4):792-795 |
| Databáze: | ScienceDirect |
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