Atomic layer deposition of titanium nitride from TDMAT precursor
| Autor: | Musschoot, J., Xie, Q., Deduytsche, D., Van den Berghe, S., Van Meirhaeghe, R.L., Detavernier, C. |
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| Zdroj: | In Microelectronic Engineering 2009 86(1):72-77 |
| Databáze: | ScienceDirect |
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