Patterning of narrow porous SiOCH trenches using a TiN hard mask
| Autor: | Darnon, M., Chevolleau, T., Eon, D., Bouyssou, R., Pelissier, B., Vallier, L., Joubert, O., Posseme, N., David, T., Bailly, F., Torres, J. |
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| Zdroj: | In Microelectronic Engineering 2008 85(11):2226-2235 |
| Databáze: | ScienceDirect |
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