Stencil-assisted reactive ion etching for micro and nano patterning
Autor: | Viallet, B., Grisolia, J., Ressier, L., Van Den Boogaart, M.A.F., Brugger, J., Lebraud, T. |
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Zdroj: | In Microelectronic Engineering 2008 85(8):1705-1708 |
Databáze: | ScienceDirect |
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