Stencil-assisted reactive ion etching for micro and nano patterning

Autor: Viallet, B., Grisolia, J., Ressier, L., Van Den Boogaart, M.A.F., Brugger, J., Lebraud, T.
Zdroj: In Microelectronic Engineering 2008 85(8):1705-1708
Databáze: ScienceDirect