Three-dimensional SU-8 sub-micrometer structuring by electron beam lithography

Autor: Koller, Daniel M., Hohenau, Andreas, Ditlbacher, Harald, Galler, Nicole, Baudrion, Anne-Laure, Reil, Frank, Schausberger, Stefan, Aussenegg, Franz R., Leitner, Alfred, Krenn, Joachim R.
Zdroj: In Microelectronic Engineering 2008 85(7):1639-1641
Databáze: ScienceDirect