Three-dimensional SU-8 sub-micrometer structuring by electron beam lithography
Autor: | Koller, Daniel M., Hohenau, Andreas, Ditlbacher, Harald, Galler, Nicole, Baudrion, Anne-Laure, Reil, Frank, Schausberger, Stefan, Aussenegg, Franz R., Leitner, Alfred, Krenn, Joachim R. |
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Zdroj: | In Microelectronic Engineering 2008 85(7):1639-1641 |
Databáze: | ScienceDirect |
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