Surface properties restoration and passivation of high porosity ultra low- k dielectric ( k ∼ 2.3) after direct-CMP
| Autor: | Sinapi, F., Heylen, N., Travaly, Y., Vereecke, G., Baklanov, M., Kesters, E., Van Hoeymissen, J., Hernandèz, J.L., Beyer, G., Fischer, P. |
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| Zdroj: | In Microelectronic Engineering 2007 84(11):2620-2623 |
| Databáze: | ScienceDirect |
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