Effect of plasma operation pressure on burn-in efficiency of an SIP–PVD chamber
Autor: | Lin, Yi-Chi, Li, Ming-Yen, Wu, Hsiao-Che, Chuang, Poyo, Huang, Cheng-Sung |
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Zdroj: | In Microelectronic Engineering 2008 85(1):126-130 |
Databáze: | ScienceDirect |
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