Effect of plasma operation pressure on burn-in efficiency of an SIP–PVD chamber

Autor: Lin, Yi-Chi, Li, Ming-Yen, Wu, Hsiao-Che, Chuang, Poyo, Huang, Cheng-Sung
Zdroj: In Microelectronic Engineering 2008 85(1):126-130
Databáze: ScienceDirect