Oxide interface studies using second harmonic generation
| Autor: | Tolk, N.H., Alles, M.L., Pasternak, R., Lu, X., Schrimpf, R.D., Fleetwood, D.M., Dolan, R.P., Standley, R.W. |
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| Zdroj: | In Microelectronic Engineering 2007 84(9):2089-2092 |
| Databáze: | ScienceDirect |
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