Integration of functional epitaxial oxides into silicon: from high- k application to nanostructures

Autor: Osten, H.J., Czernohorsky, M., Dargis, R., Laha, A., Kühne, D., Bugiel, E., Fissel, A.
Zdroj: In Microelectronic Engineering 2007 84(9):2222-2225
Databáze: ScienceDirect