Recent advances and current challenges in the search for high mobility band-edge high-k/metal gate stacks
| Autor: | Narayanan, V., Paruchuri, V.K., Cartier, E., Linder, B.P., Bojarczuk, N., Guha, S., Brown, S.L., Wang, Y., Copel, M., Chen, T.C. |
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| Zdroj: | In Microelectronic Engineering 2007 84(9):1853-1856 |
| Databáze: | ScienceDirect |
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