Reliability degradation of HfSiO gate dielectric layers: influence of nitridation
| Autor: | Vellianitis, G., Pétry, J., Hooker, J.C., Delabie, A., De Gendt, S. |
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| Zdroj: | In Microelectronic Engineering 2007 84(9):1972-1975 |
| Databáze: | ScienceDirect |
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