Understanding of the thermal stability of the hafnium oxide/TiN stack via 2 “high k” and 2 metal deposition techniques
| Autor: | Cosnier, V., Besson, P., Loup, V., Vandroux, L., Minoret, S., Cassé, M., Garros, X., Pedini, J-M., Lhostis, S., Dabertrand, K., Morin, C., Wiemer, C., Perego, M., Fanciulli, M. |
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| Zdroj: | In Microelectronic Engineering 2007 84(9):1886-1889 |
| Databáze: | ScienceDirect |
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