A lateral nanoscale linewidth/pitch standard for every day calibration of high-resolution microscopy techniques
| Autor: | Huebner, Uwe, Boucher, R., Meyer, M., Mirandé, W., Buhr, E., Ehret, G. |
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| Zdroj: | In Microelectronic Engineering 2007 84(5):1797-1800 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect