The passivation layer formation in the cryo-etching plasma process
| Autor: | Dussart, R., Mellhaoui, X., Tillocher, T., Lefaucheux, P., Boufnichel, M., Ranson, P. |
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| Zdroj: | In Microelectronic Engineering 2007 84(5):1128-1131 |
| Databáze: | ScienceDirect |
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