High-quality high- k HfON formed with plasma jet assisted PVD process and application as tunnel dielectric for flash memories
| Autor: | Liu, Yanxiang, Shim, Sun Il, Wang, X.W., Lee, Lurng-Shehng, Tsai, Ming-Jinn, Ma, T.P. |
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| Zdroj: | In Microelectronic Engineering 2008 85(1):45-48 |
| Databáze: | ScienceDirect |
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