Improved electrical and reliability performance of 65 nm interconnects with new barrier integration schemes
| Autor: | Delsol, R., Jacquemin, J.-P., Gregoire, M., Girault, V., Federspiel, X., Bouyssou, R.-X., Vannier, P., Normandon, P. |
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| Zdroj: | In Microelectronic Engineering 2006 83(11):2377-2380 |
| Databáze: | ScienceDirect |
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