Growth of Ru/RuO 2 layers with atomic vapor deposition on plain wafers and into trench structures
| Autor: | Manke, C., Boissière, O., Weber, U., Barbar, G., Baumann, P.K., Lindner, J., Tapajna, M., Fröhlich, K. |
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| Zdroj: | In Microelectronic Engineering 2006 83(11):2277-2281 |
| Databáze: | ScienceDirect |
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