New techniques to characterize properties of advanced dielectric barriers for sub-65 nm technology node

Autor: Vitiello, J., Ducote, V., Farcy, A., Gosset, L.G., Le-Friec, Y., Hopstaken, M., Jullian, S., Cordeau, M., Ailhas, C., Chapelon, L.L., Barbier, D., Veillerot, M., Danel, A., Torres, J.
Zdroj: In Microelectronic Engineering 2006 83(11):2130-2135
Databáze: ScienceDirect