Atomic layer deposited WN xC y films growth on SiC surfaces
| Autor: | Martin Hoyas, A., Whelan, C.M., Schuhmacher, J., Maex, K., Celis, J.P. |
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| Zdroj: | In Microelectronic Engineering 2006 83(11):2068-2071 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Martin Hoyas, A., Whelan, C.M., Schuhmacher, J., Maex, K., Celis, J.P. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2006 83(11):2068-2071 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect