Nano-patterning using an embedded particle monolayer as an etch mask
| Autor: | Nakanishi, Tsutomu, Hiraoka, Toshiro, Fujimoto, Akira, Saito, Satoshi, Asakawa, Koji |
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| Zdroj: | In Microelectronic Engineering 2006 83(4):1503-1508 |
| Databáze: | ScienceDirect |
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