Direct pattern transfer for sub-45 nm features using nanoimprint lithography
| Autor: | Le, Ngoc V., Dauksher, William J., Gehoski, Kathy A., Nordquist, Kevin J., Ainley, Eric, Mangat, Pawitter |
|---|---|
| Zdroj: | In Microelectronic Engineering 2006 83(4):839-842 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect