Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator
| Autor: | Eder-Kapl, Stefan, Haugeneder, Ernst, Langfischer, Helmut, Reimer, Klaus, Eichholz, Joerg, Witt, Martin, Doering, Hans-Joachim, Heinitz, Joachim, Brandstaetter, Christoph |
|---|---|
| Zdroj: | In Microelectronic Engineering 2006 83(4):968-971 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect