Double line shrink lithography at k1 = 0.16
| Autor: | Noelscher, Christoph, Heller, Marcel, Habets, Boris, Markert, Matthias, Scheler, Uli, Moll, Peter |
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| Zdroj: | In Microelectronic Engineering 2006 83(4):730-733 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Noelscher, Christoph, Heller, Marcel, Habets, Boris, Markert, Matthias, Scheler, Uli, Moll, Peter |
|---|---|
| Zdroj: | In Microelectronic Engineering 2006 83(4):730-733 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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Full Text from ScienceDirect