Electron beam lithography, a helpful tool for nanooptics

Autor: Hohenau, Andreas, Ditlbacher, Harald, Lamprecht, Bernhard, Krenn, Joachim R., Leitner, Alfred, Aussenegg, Franz R.
Zdroj: In Microelectronic Engineering 2006 83(4):1464-1467
Databáze: ScienceDirect