Benchmark of a lithography simulation tool for next generation applications
| Autor: | Tollkühn, B., Uhle, M., Fuhrmann, J., Gärtner, K., Heubner, A., Erdmann, A. |
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| Zdroj: | In Microelectronic Engineering 2006 83(4):1142-1147 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect