Effects of model polymer chain architectures and molecular weight of conventional and chemically amplified photoresists on line-edge roughness. Stochastic simulations
| Autor: | Patsis, George P., Gogolides, Evangelos |
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| Zdroj: | In Microelectronic Engineering 2006 83(4):1078-1081 |
| Databáze: | ScienceDirect |
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