Membrane mask aero and thermoelastic control for proximity lithography
| Autor: | Huston, Dryver, Plumpton, James, Esser, Brian, Burns, Dylan, Boerger, Brent, Selzer, Robert |
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| Zdroj: | In Microelectronic Engineering 2006 83(4):923-925 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect