Investigation of Ta 2O 5/SiO 2/4H-SiC MIS capacitors

Autor: Zhao, P., Rusli, Lok, B.K., Lai, F.K., Tin, C.C., Zhao, J.H., Yar, R.M.
Zdroj: In Microelectronic Engineering 2006 83(1):58-60
Databáze: ScienceDirect
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