The role of oxygen in electron cyclotron resonance etching of silicon carbide
| Autor: | Xia, J.H., Rusli, Choy, S.F., Gopalakrishan, R., Tin, C.C., Ahn, J. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2006 83(1):9-11 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
| Autor: | Xia, J.H., Rusli, Choy, S.F., Gopalakrishan, R., Tin, C.C., Ahn, J. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2006 83(1):9-11 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect