Deposition temperature determination of HDPCVD silicon dioxide films

Autor:	Gulleri, G., Carpanese, C., Cascarano, C., Lodi, D., Ninni, R., Ottaviani, G.
Zdroj:	In Microelectronic Engineering 2005 82(3):236-241
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect