Ultra-thin strained SOI substrate analysis by pseudo-MOS measurements
| Autor: | Gallon, C., Fenouillet-Beranger, C., Bresson, N., Cristoloveanu, S., Allibert, F., Bord, S., Aulnette, C., Delille, D., Latu-Romain, E., Hartmann, J.M., Ernst, T., Andrieu, F., Campidelli, Y., Ghyselen, B., Cayrefourcq, I., Fournel, F., Kernevez, N., Skotnicki, T. |
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| Zdroj: | In Microelectronic Engineering 17 June 2005 80:241-244 |
| Databáze: | ScienceDirect |
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