Design of low Tg thermosets for short cycle time nanoimprint lithography
Autor: | Reuther, F., Fink, M., Kubenz, M., Schuster, C., Vogler, M., Gruetzner, G. |
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Zdroj: | In Microelectronic Engineering 2005 78:496-502 |
Databáze: | ScienceDirect |
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