Line end shortening in CPL mask technology
Autor: | Conley, Will, Kuijten, Jan Pieter, Verhappen, Arjan, van de Goor, Stefan, Litt, Lloyd, Wu, Wei, Lucas, Kevin, Roman, Bernie, Kasprowicz, Bryan, Progler, Chris, Socha, Robert, van den Broeke, Doug, Wampler, Kurt, Laidig, Tom, Hsu, Stephen, Schaefer, Erika, Cook, Pat |
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Zdroj: | In Microelectronic Engineering 2005 78:393-397 |
Databáze: | ScienceDirect |
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