Low temperature spike anneal for Ni-silicide formation
| Autor: | Lauwers, A., Kittl, J.A., Van Dal, M., Chamirian, O., Lindsay, R., de Potter, M., Demeurisse, C., Vrancken, C., Maex, K., Pagès, X., Van der Jeugd, K., Kuznetsov, V., Granneman, E. |
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| Zdroj: | In Microelectronic Engineering October 2004 76(1-4):303-310 |
| Databáze: | ScienceDirect |
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