3D patterning by means of nanoimprinting, X-ray and two-photon lithography

Autor:	Tormen, M., Businaro, L., Altissimo, M., Romanato, F., Cabrini, S., Perennes, F., Proietti, R., Sun, Hong-Bo, Kawata, Satoshi, Di Fabrizio, E.
Zdroj:	In Microelectronic Engineering 2004 73:535-541
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect