Exploring the high sensitivity of SU-8 resist for high resolution electron beam patterning
| Autor: | Pépin, A., Studer, V., Decanini, D., Chen, Y. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2004 73:233-237 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
| Autor: | Pépin, A., Studer, V., Decanini, D., Chen, Y. |
|---|---|
| Zdroj: | In Microelectronic Engineering 2004 73:233-237 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect