Processing chemically amplified resists on advanced photomasks using a thermal array
| Autor: | Schaper, Charles D., El-Awady, Khalid, Kailath, T., Tay, Arthur, Lee, Lay Lay, Ho, W.-Khuen, Fuller, Scott E. |
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| Zdroj: | In Microelectronic Engineering 2004 71(1):63-68 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect