Single damascene integration of porous Zirkon™ version 1 low- k dielectric films
| Autor: | Malhouitre, S. ∗, Jehoul, C., Van Aelst, J., Struyf, H., Brongersma, S., Carbonell, L., Vos, I., Beyer, G., Van Hove, M., Gronbeck, D., Gallagher, M., Calvert, J., Maex, K. |
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| Zdroj: | In Microelectronic Engineering 2003 70(2):302-307 |
| Databáze: | ScienceDirect |
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