Ni- and Co-based silicides for advanced CMOS applications
| Autor: | Kittl, J.A. ∗, Lauwers, A., Chamirian, O., Van Dal, M., Akheyar, A., De Potter, M., Lindsay, R., Maex, K. |
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| Zdroj: | In Microelectronic Engineering 2003 70(2):158-165 |
| Databáze: | ScienceDirect |
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