In situ plasma diagnostics for chemical vapor deposition of nano-carbon thin film materials

Autor: Obraztsov, A.N. a, ∗, Zolotukhin, A.A. a, Ustinov, A.O. a, Volkov, A.P. a, Svirko, Yu. b, Jefimovs, K. b
Zdroj: In Microelectronic Engineering 2003 69(2):446-451
Databáze: ScienceDirect